Liquid processing apparatus
US9192878B2 · kind B2 · utility
3Cited by
0References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 27, 2013 |
| Grant date | Nov 24, 2015 |
| Priority date | — |
| Expiry date | Mar 28, 2034 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67023
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A liquid processing apparatus and a chemical liquid collecting method can suppress corrosion of wirings formed on a substrate. The liquid processing apparatus includes a processing unit configured to perform a liquid process by supplying a chemical liquid to a substrate; a collecting line configured to collect the chemical liquid supplied to the processing unit; a supply line configured to supply the collected chemical liquid to the processing unit; and a gas supply unit configured to supply an inert gas into the collecting line.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.