Ion beam sample preparation apparatus and methods
US9196455B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 27, 2014 |
| Grant date | Nov 24, 2015 |
| Priority date | — |
| Expiry date | Jul 27, 2034 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/31745
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Ion beam sample preparation apparatus and methods are described. The apparatus has disposed in a vacuum chamber at least one tilting ion beam irradiating means with intensity control, a rotation stage with rotation control, a sample holder, and an adjustable positioning stage that has two axes of positional adjustment that are operable to move the region of the sample being prepared by the ion beam relative to the ion beam. The apparatus may also include a vacuum-tight optical window for observing the sample and a shutter for protecting the optical window from debris while the sample is prepared in the ion beam. The apparatus may also include an instrument controller responsive to the state of the apparatus and to the condition of the sample and is operable to control the preparation of the sample.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.