Patent · US Active

Processing liquid for suppressing pattern collapse of fine metal structure, and method for producing fine metal structure using same

US9196472B2 · kind B2 · utility

2Cited by
7References
16Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJul 21, 2010
Grant dateNov 24, 2015
Priority date
Expiry dateDec 15, 2030

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB81C1/00928
  • WIPO fieldMicro-structural and nano-technology
  • WIPO sectorChemistry

Abstract

There are provided a processing liquid that is capable of suppressing pattern collapse of a fine metal structure, such as a semiconductor device and a micromachine, and a method for producing a fine metal structure using the same. The processing liquid for suppressing pattern collapse of a fine metal structure, contains a phosphate ester and/or a polyoxyalkylene ether phosphate ester, and the method for producing a fine metal structure, uses the same.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.