Metal amide deposition precursors and their stabilization with an inert ampoule liner
US9196474B2 · kind B2 · utility
1Cited by
3References
6Claims
0Family size
Assignee
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Key dates
| Filing date | Feb 28, 2014 |
| Grant date | Nov 24, 2015 |
| Priority date | — |
| Expiry date | Feb 28, 2034 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/02194
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Described are methods and apparatuses for the stabilization of precursors, which can be used for the deposition of manganese-containing films. Certain methods and apparatus relate to lined ampoules and/or 2-electron donor ligands.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.