Patent · US Active

Electrostatic chuck

US9202718B2 · kind B2 · utility

2Cited by
12References
11Claims
0Family size

Assignee

Inventors

Key dates

Filing dateApr 17, 2013
Grant dateDec 1, 2015
Priority date
Expiry dateSep 14, 2033

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T428/24942
  • WIPO fieldMaterials, metallurgy
  • WIPO sectorChemistry

Abstract

An electrostatic chuck 1A includes a susceptor 11A having an adsorption face 11a of adsorbing a semiconductor, and an electrostatic chuck electrode 4 embedded in the susceptor. The susceptor 11A includes a plate shaped main body 3 and a surface corrosion resistant layer 2 including the adsorption face 2. The surface corrosion resistant layer 2 is made of a ceramic material comprising magnesium, aluminum, oxygen and nitrogen as main components. The ceramic material comprises a main phase comprising magnesium-aluminum oxynitride phase exhibiting an XRD peak at least in 2θ=47 to 50° by CuKα X-ray.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.