Patent · US Active

Arrangement for mirror temperature measurement and/or thermal actuation of a mirror in a microlithographic projection exposure apparatus

US9207541B2 · kind B2 · utility

3Cited by

9References

25Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Markus Hauf · Ulm, DE
Norman Baer · Aalen, DE
Holger Walter · Aalen, DE
Joachim Hartjes · Aalen, DE

Key dates

Filing date	Mar 5, 2013
Grant date	Dec 8, 2015
Priority date	—
Expiry date	Dec 18, 2033

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70891
WIPO fieldOptics
WIPO sectorInstruments

Abstract

The disclosure concerns an arrangement for mirror temperature measurement and/or thermal actuation of a mirror in a microlithographic projection exposure apparatus. The mirror has an optical effective surface and at least one access passage extending from a surface of the mirror, that does not correspond to the optical effective surface, in the direction of the effective surface. The arrangement is designed for mirror temperature measurement and/or thermal actuation of the mirror via electromagnetic radiation which is propagated along the access passage. The electromagnetic radiation is reflected a plurality of times within the access passage.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.