Electron beam exposure method
US9213240B2 · kind B2 · utility
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6Claims
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Key dates
| Filing date | Feb 26, 2015 |
| Grant date | Dec 15, 2015 |
| Priority date | — |
| Expiry date | Feb 26, 2035 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/31776
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An electron beam exposure method includes the steps of: preparing an exposure mask having a plurality of opening patterns formed by dividing a drawing object pattern into exposable regions; and drawing the drawing object pattern by performing exposure with an electron beam passing through the opening patterns of the exposure mask. Each end portion serving as a joint in each opening pattern of the exposure mask is provided with a joining portion tapered in a width of the opening pattern. The exposure is performed in such a way that portions drawn through adjacent joining portions overlap each other.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.