Patent · US Active

Optical system and multi facet mirror of a microlithographic projection exposure apparatus

US9213245B2 · kind B2 · utility

1Cited by

2References

18Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Damian Fiolka · Oberkochen, DE
Juergen Baier · Oberkochen, DE

Key dates

Filing date	Dec 14, 2012
Grant date	Dec 15, 2015
Priority date	—
Expiry date	Dec 11, 2033

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70141
WIPO fieldOptics
WIPO sectorInstruments

Abstract

An optical system of a microlithographic projection exposure apparatus includes a multi facet mirror having a support plate and a plurality of mirror facets. Each mirror facet includes a mirror substrate and a reflective coating applied thereon, and is attached to the support plate. Actuators are provided that induce a deformation of the support plate. The deformation changes the orientation and/or position, but not the shape, of at least two mirror facets. In this way aberrations can be corrected.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.