Thermal treatment apparatus and thermal treatment method
US9214371B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Feb 8, 2012 |
| Grant date | Dec 15, 2015 |
| Priority date | — |
| Expiry date | Apr 7, 2033 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67017
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
In a loading area below a vertical furnace of a thermal treatment apparatus, a gas stream flows along a first direction from one side to the other side of the loading area into a first evacuation opening provided in the other side of the loading area. A thermal evacuation part is located, along the first direction, between a first evacuation opening and an upstream end of a substrate holding member located at an unload position that is located between the one side and the other side of the loading area. The thermal evacuation part includes a second evacuation opening that is arranged to oppose at least an upper part of the substrate holding member located at the unload position and evacuates an environment around the substrate holding member located at the unload position.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.