Patent · US Active

Method for producing an optical filter in an integrated circuit, and corresponding integrated circuit

US9219095B2 · kind B2 · utility

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23Claims
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Key dates

Filing dateSep 18, 2014
Grant dateDec 22, 2015
Priority date
Expiry dateSep 18, 2034

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10F39/811

Abstract

An integrated circuit includes a substrate and an interconnect part above the substrate, and further includes a photosensitive region in the substrate. A filter is provided aligned with the photosensitive region. The filter is formed by at least one layer of filter material. In one implementation for front side illumination, the layer of filter material is positioned above the photosensitive region between the interconnect part and the substrate. In another implementation for back side illumination, the layer of filter material is positioned below the photosensitive region opposite the interconnect part. The layer of filter material is configured such that a product of the thickness of the layer of filter material and the imaginary part of the refractive index of the layer of filter material is above 1 nm.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.