Patent · US Active

Salt and photoresist composition containing the same

US9221785B2 · kind B2 · utility

1Cited by
4References
6Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJun 9, 2010
Grant dateDec 29, 2015
Priority date
Expiry dateMay 15, 2031

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG03F7/38
  • WIPO fieldOrganic fine chemistry
  • WIPO sectorChemistry

Abstract

A salt having a group represented by the formula (I):-T  (I)wherein T represents a C3-C36 alicyclic hydrocarbon group in which at least two methylene groups are replaced by —O— or —S— and which can have one or more substituents.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.