Patent · US Active

Method of automatic fluid dispensing for imprint lithography processes

US9223202B2 · kind B2 · utility

14Cited by
378References
2Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJul 9, 2007
Grant dateDec 29, 2015
Priority date
Expiry dateMay 28, 2030

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L2924/1461
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

Disclosed herein is an automatic fluid dispensing method and system for dispensing fluid on the surface of a plate-like material, or substrate, including a semiconductor wafer for imprint lithography processes. The dispensing method uses fluid dispenser and a substrate stage that may generate relative lateral motions between a fluid dispenser tip a substrate. Also described herein are methods and devices for creating a planar surface on a substrate using a substantially unpatterned planar template.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.