Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition
US9223208B2 · kind B2 · utility
4Cited by
5References
15Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 29, 2011 |
| Grant date | Dec 29, 2015 |
| Priority date | — |
| Expiry date | Oct 27, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/38
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
An actinic ray- or radiation-sensitive resin composition according to the present invention comprises a sulfonic acid-generating compound that is decomposed by an action of an acid to generate a sulfonic acid having a volume of 240 Å3 or more and a compound that generates the acid when exposed to actinic rays or radiation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.