Imprint lithography template
US9227361B2 · kind B2 · utility
8Cited by
11References
16Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 13, 2013 |
| Grant date | Jan 5, 2016 |
| Priority date | — |
| Expiry date | Sep 13, 2033 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0002
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
Nano imprint lithography templates for purging of fluid during nano imprint lithography processes are described. The templates may include an inner channel and an outer channel. The inner channel constructed to provide fluid communication with a process gas supply to a region between the template and a substrate during the nano imprint lithography process. The outer channel constructed to evacuate fluid and/or confine fluid between the active area of template and the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.