Composition of matter and molecular resist made therefrom

US9229322B2 · kind B2 · utility

Inventors

• Alex Phillip Graham Robinson · Birmingham, GB
• Dongxu Yang · Harborne, GB
• Andreas Frommhold · Köthen, DE
• Thomas Lada · Somerville, US
• John Roth · Cohasset, US
• Xiang Xue · Winchester, US
• Edward A. Jackson · Franklin, US

Key dates

• Filing date: Oct 21, 2014
• Grant date: Jan 5, 2016
• Expiry date: Oct 21, 2034

Classification

• Technology area (CPC H): Electricity
• CPC primary: H10K71/233
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

Disclosed and claimed herein is a composition of matter having a general structure chosen from (I), (II), (III) or (IV);wherein X and Y are the same or different, wherein at least one of X and Y comprises an acid labile group, wherein R1 is a saturated or unsaturated group having from 1-4 carbon atoms, R2 is chosen from hydrogen or a saturated or unsaturated group having from 1-4 carbon atoms, R3 is a saturated or unsaturated group having from 1-4 carbon atoms, and R4 is a saturated or unsaturated group having from 1-4 carbon atoms.