Method for writing nanoscale patterns
US9229330B2 · kind B2 · utility
Inventors
Key dates
| Filing date | Aug 26, 2014 |
| Grant date | Jan 5, 2016 |
| Priority date | — |
| Expiry date | Aug 26, 2034 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11B7/00
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of performing nanolithography is disclosed, comprising the use of a system having a plasmonic writing head that enables super-resolution exposures of a material. The super-resolution exposures are carried out using light directed onto a material using plasmonic structures, and in particular using plasmonic structures having specially designed super-resolution apertures, of which the “bow-tie” and “C-aperture” are examples. These specially designed apertures create small but bright images in the near-field transmission pattern. In one embodiment, a writing head comprising an array of these apertures is held in close proximity to a lithography material. A data processing system is provided to re-interpret the data to be patterned into a set of modulation signals used to drive the multiple individual channels and the multiple exposures. A detector system using light of a second wavelength to monitor the exposures is also provided.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.