MEMS device and method of forming the same
US9233839B2 · kind B2 · utility
50Cited by
1References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 1, 2013 |
| Grant date | Jan 12, 2016 |
| Priority date | — |
| Expiry date | Aug 1, 2033 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB81C2203/0714
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
A method for forming a MEMS device is provided. The method includes the following steps of providing a substrate having a first portion and a second portion; fabricating a membrane type sensor on the first portion of the substrate; and fabricating a bulk silicon sensor on the second portion of the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.