Actinic-ray- or radiation sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern
US9235116B2 · kind B2 · utility
3Cited by
4References
19Claims
0Family size
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Key dates
| Filing date | Dec 12, 2013 |
| Grant date | Jan 12, 2016 |
| Priority date | — |
| Expiry date | Jan 24, 2034 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/78
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes a compound (P) containing at least one phenolic hydroxyl group and at least one group with a phenolic hydroxyl group whose hydrogen atom is replaced by any of groups of general formula (1) below.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.