Projection exposure apparatus for projection lithography
US9235136B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Nov 13, 2014 |
| Grant date | Jan 12, 2016 |
| Priority date | — |
| Expiry date | Nov 13, 2034 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70575
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A projection exposure apparatus for projection lithography comprises a light source for generating illumination light. An illumination optical unit guides the light to an object field. A catadioptric projection optical unit with at least one curved mirror images an object in the object field onto a substrate in an image field. An object displacement drive- and a substrate displacement drive serve to displace the object and the substrate. A compensation device serves to compensate aberrations of the projection optical unit, which are caused by an arching of the object or the substrate. The compensation device comprises a wavelength manipulation device for manipulating a wavelength of the illumination light during the projection exposure. The result of this is a projection exposure apparatus in which the imaging quality of the projection optical unit is optimized, particularly taking into account a field curvature.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.