Patent · US Active

Illumination optical unit for microlithography

US9235137B2 · kind B2 · utility

1Cited by

4References

23Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Damian Fiolka · Oberkochen, DE
Ralf Stuetzle · Aalen, DE

Key dates

Filing date	Feb 10, 2012
Grant date	Jan 12, 2016
Priority date	—
Expiry date	Mar 28, 2033

Classification

Technology area (CPC G)Physics
CPC primaryG21K2201/067
WIPO fieldOptics
WIPO sectorInstruments

Abstract

An illumination optical unit includes a collector mirror which produces a polarization distribution that is applied to the first faceted optical element during the operation of the illumination optical unit. There are at least two first facet elements to which radiation having a differing polarization is applied. The first faceted optical element has at least one first state in which the normal vectors of the reflective surfaces of the first facet elements are selected so that a first predetermined polarization distribution results at the location of the object field during the operation of the illumination optical unit.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.