Patent · US Active

Pressure application apparatus and pressure application method

US9243894B2 · kind B2 · utility

4Cited by
4References
27Claims
0Family size

Assignee

Inventor

Key dates

Filing dateMar 9, 2010
Grant dateJan 26, 2016
Priority date
Expiry dateNov 3, 2032

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY02P70/50
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

A pressure application technique is provided that enables two objects to be pressurized (e.g., objects to be bonded) to be positioned with greater accuracy before having pressure applied thereto. The objects to be pressurized are moved relative to each other in a Z direction such that the objects are brought into contact with each other (step S13). Then, a horizontal positional shift ΔD between the objects to be pressurized is measured in the contact state of the objects to be pressurized (step S14). Thereafter, positioning of the objects to be pressurized is again performed by moving the objects to be pressurized relative to each other in the horizontal direction, as a result of which the positional shift ΔD is corrected (step S17).

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.