Apparatus and methods for positioning a substrate using capacitive sensors
US9245786B2 · kind B2 · utility
6Cited by
8References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 2, 2011 |
| Grant date | Jan 26, 2016 |
| Priority date | — |
| Expiry date | Jan 20, 2033 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67259
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Embodiments of the present invention provide apparatus and methods for positioning a substrate in a processing chamber using capacitive sensors. One embodiment of the present invention provides an apparatus for processing a substrate. The apparatus includes first and second capacitive sensors disposed in an inner volume. The first capacitive sensor is positioned to detect a location of an edge of the substrate at a first angular location. The second capacitive sensor is positioned to detect a vertical position of the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.