Detection devices and methods using diffraction wavefront of a pinhole stitching measurement of surface shape
US9250059B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 24, 2015 |
| Grant date | Feb 2, 2016 |
| Priority date | — |
| Expiry date | Apr 24, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01B11/2441
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The present disclosure provides detection devices and methods using a diffraction wavefront of a pinhole stitching measurement of surface shape. The light emitted from the laser passes through a filter hole, a first condenser lens, a spatial filter, a beam expander, a half wave plate, a λ/4 wave plate, an attention plate and then is transmitted through a beam splitter, reflected by a reflecting mirror and is irradiated onto an pinhole through a first optical adjustable shelf and a second set of condenser lens. A part of diffraction light generated by the pinhole is irradiated to the mirror to be measured; the light reflected by the mirror to be measured is reflected by a frame of the pinhole and generate a diffraction fringe along with another part of the diffraction wavefront of the pinhole. The interference fringe is focused by the third set of condenser lens on the third optical adjustable shelf and is collected by the CCD detector. The mirror to be measured is positioned on the second optical adjustable shelf and may be moved along a normal direction of the mirror to be measured to implement an annular aperture stitching measurement. Meanwhile, the first optical adjustable shel…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.