Optical arrangement in a microlithographic projection exposure apparatus

US9250417B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Dirk Schaffer · Jena, DE
• Stefan Hembacher · Bobingen, DE
• Jens Kugler · Heubach, DE

Key dates

• Filing date: May 9, 2012
• Grant date: Feb 2, 2016
• Expiry date: Sep 30, 2034

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/70316
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

The disclosure relates to optical arrangements in a microlithographic projection exposure apparatus. In accordance with one aspect, an optical arrangement has at least one mirror segment arrangement including a plurality of separate mirror segments. The mirror segments are connected to a carrying structure of the projection exposure apparatus via mounting elements. At least one of the mounting elements, which is assigned to a first one of the mirror segments, extends, on the opposite side to the optically active surface of the mirror segment arrangement, at least partly into the region of a second mirror segment of the mirror segment arrangement. The second mirror segment is adjacent to the first mirror segment.