Localized, in-vacuum modification of small structures
US9255339B2 · kind B2 · utility
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26References
16Claims
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Key dates
| Filing date | Sep 19, 2011 |
| Grant date | Feb 9, 2016 |
| Priority date | — |
| Expiry date | Mar 5, 2034 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/2801
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A charge transfer mechanism is used to locally deposit or remove material for a small structure. A local electrochemical cell is created without having to immerse the entire work piece in a bath. The charge transfer mechanism can be used together with a charged particle beam or laser system to modify small structures, such as integrated circuits or microelectromechanical system. The charge transfer process can be performed in air or, in some embodiments, in a vacuum chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.