Methanofullerenes
US9256126B2 · kind B2 · utility
1Cited by
43References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 31, 2013 |
| Grant date | Feb 9, 2016 |
| Priority date | — |
| Expiry date | Oct 31, 2033 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC07C2604/00
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present disclosure relates to novel methanofullerene derivatives, negative-type photoresist compositions prepared therefrom and methods of using them. The derivatives, their photoresist compositions and the methods are ideal for fine pattern processing using, for example, ultraviolet radiation, beyond extreme ultraviolet radiation, extreme ultraviolet radiation, X-rays and charged particle rays.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.