Monomer, polymer, resist composition, and patterning process
US9256127B2 · kind B2 · utility
1Cited by
12References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 28, 2015 |
| Grant date | Feb 9, 2016 |
| Priority date | — |
| Expiry date | Apr 28, 2035 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08F220/365
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
A polymer for resist use is obtainable from a monomer having formula (1) wherein R1 is H, CH3 or CF3, R2 and R3 each are H or a monovalent hydrocarbon group, X1 is a divalent hydrocarbon group, k1=0 or 1, and Z forms a 5 or 6-membered alicyclic ring. A resist composition comprising the polymer is shelf stable and displays a high dissolution contrast, controlled acid diffusion and low roughness during both alkaline development and organic solvent development.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.