Method and system for adaptively scanning a sample during electron beam inspection
US9257260B2 · kind B2 · utility
2Cited by
22References
34Claims
0Family size
Assignee
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Key dates
| Filing date | Apr 23, 2014 |
| Grant date | Feb 9, 2016 |
| Priority date | — |
| Expiry date | Apr 23, 2034 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/2817
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A system for adaptive electron beam scanning may include an inspection sub-system configured to scan an electron beam across the surface of a sample. The inspection sub-system may include an electron beam source, a sample stage, a set of electron-optic elements, a detector assembly and a controller communicatively coupled to one or more portions of the inspection sub-system. The controller may assess one or more characteristics of one or more portions of an area of the sample for inspection and, responsive to the assessed one or more characteristics, adjust one or more scan parameters of the inspection sub-system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.