Patent · US Active

Photoresist application

US9261791B2 · kind B2 · utility

0Cited by

0References

21Claims

0Family size

Assignee

Infineon Technologies AG · DE

Inventors

Thomas Walter · Oldenburg, DE
Andreas Behrendt · Villach, AT

Key dates

Filing date	Mar 15, 2013
Grant date	Feb 16, 2016
Priority date	—
Expiry date	Mar 15, 2033

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/162
WIPO fieldOptics
WIPO sectorInstruments

Abstract

Devices and methods are provided where photoresist is applied on a substrate and at least some regions of the photoresist are dried prior to removing a substrate from a substrate support.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.