Fluorine-based resins and photosensitive resin composition comprising the same
US9274423B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 31, 2012 |
| Grant date | Mar 1, 2016 |
| Priority date | — |
| Expiry date | May 31, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0007
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
The present application relates to a fluorine-based resin having a novel structure and a photosensitive resin composition including the same. The photosensitive resin composition including the fluorine-based resin according to an exemplary embodiment of the present application has excellent photosensitivity and developability and can increase a contact angle of a coating film to prevent a water stain. Accordingly, the photosensitive resin composition including the fluorine-based resin according to the exemplary embodiment of the present application may be applied to various photosensitive materials, and particularly, may be preferably applied when a color filter pattern for LCD is manufactured.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.