Patent · US Active

Recycling unit and substrate treating apparatus

US9275847B2 · kind B2 · utility

14Cited by
5References
33Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMar 28, 2014
Grant dateMar 1, 2016
Priority date
Expiry dateAug 29, 2034

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L21/67051
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

The substrate treating apparatus includes a drying chamber in which an organic solvent remaining on a substrate is dissolved by using a fluid, and a recycling unit including a separator for separating the organic solvent from the fluid discharged from the drying chamber to recycle the fluid. The separator includes a distiller in which a fluid containing an organic solvent having a first concentration is introduced, a heating unit heating a fluid containing an organic solvent having a second concentration discharged from the distiller, and supplying an evaporated fluid containing an organic solvent having a third concentration into the distiller, and a condensation unit liquefying a fluid containing an organic solvent having a fourth concentration discharged from the distiller. The organic solvent has the second concentration, the first concentration, the third concentration, and the fourth concentration which are successively lowered in concentration.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.