Nanowire and planar transistors co-integrated on utbox SOI substrate
US9276073B2 · kind B2 · utility
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8References
13Claims
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Key dates
| Filing date | May 1, 2014 |
| Grant date | Mar 1, 2016 |
| Priority date | — |
| Expiry date | Jun 10, 2034 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P70/50
Abstract
Fabrication of a microelectronic device on a semiconductor on insulator type substrate, the device being provided with a transistor of a given type, the channel structure of which is formed from semiconducting bar(s), a dielectric area different from the insulating layer of the substrate being provided to replace the insulating layer, facing the transistor channel structure, specifically for this given type of transistor.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.