Dual source system and method
US9285272B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Jul 17, 2012 |
| Grant date | Mar 15, 2016 |
| Priority date | — |
| Expiry date | Apr 25, 2034 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2201/0221
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A dual source system and method includes a high power laser used to determine elemental concentrations in a sample and a lower power device used to determine compounds present in the sample. A detector subsystem receives photons from the sample after laser energy from the high power laser strikes the sample and provides a first signal. The detector subsystem then receives photons from the sample after energy from the lower power device strikes the sample and provides a second signal. The high power laser is pulsed and the first signal is processed to determine elemental concentrations present in the sample. The lower power device is energized and the second signal is processed to determine compounds present in the signal. Based on the elemental concentrations and the compounds present, the compounds present in the sample are quantified.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.