System, method and apparatus for controlling ion energy distribution
US9287086B2 · kind B2 · utility
100Cited by
57References
7Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 29, 2010 |
| Grant date | Mar 15, 2016 |
| Priority date | — |
| Expiry date | Apr 30, 2031 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3299
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Systems, methods and apparatus for regulating ion energies in a plasma chamber are disclosed. An exemplary method includes placing a substrate in a plasma chamber, forming a plasma in the plasma chamber, controllably switching power to the substrate so as to apply a periodic voltage function to the substrate, and modulating, over multiple cycles of the periodic voltage function, the periodic voltage function responsive to a desired distribution of energies of ions at the surface of the substrate so as to effectuate the desired distribution of ion energies on a time-averaged basis.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.