Method and apparatus for controlling ion energy distribution
US9287092B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 26, 2010 |
| Grant date | Mar 15, 2016 |
| Priority date | — |
| Expiry date | Apr 15, 2031 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH02M3/158
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Systems, methods and apparatus for regulating ion energies in a plasma chamber are disclosed. An exemplary system includes an ion-energy control portion, and the ion-energy control portion provides at least one ion-energy control signal responsive to at least one ion-energy setting that is indicative of a desired distribution of energies of ions bombarding a surface of a substrate. A controller is coupled to the switch-mode power supply, and the controller provides at least two drive-control signals. In addition, a switch-mode power supply is coupled to the substrate support, the ion-energy control portion and the controller. The switch-mode power supply includes switching components configured to apply power to the substrate responsive to the drive signals and the ion-energy control signal so as to effectuate the desired distribution of the energies of ions bombarding the surface of the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.