Method for forming an electrically conductive oxide film, an electrically conductive oxide film, and uses for the same
US9290840B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Nov 2, 2010 |
| Grant date | Mar 22, 2016 |
| Priority date | — |
| Expiry date | Feb 4, 2032 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C30/00
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method for forming an electrically conductive oxide film (1) on a substrate (2), the method comprising the steps of, bringing the substrate (2) into a reaction space, forming a preliminary deposit on a deposition surface of the substrate (2) and treating the deposition surface with a chemical. The step of forming the preliminary deposit on the deposition surface of the substrate (2) comprises forming a preliminary deposit of transition metal oxide on the deposition surface and subsequently purging the reaction space. The step of treating the deposition surface with a chemical comprises treating the deposition surface with an organometallic chemical and subsequently purging the reaction space, to form oxide comprising oxygen, first metal and transition metal. The steps of forming the preliminary deposit and treating the deposition surface being alternately repeated such that a film (1) of electrically conductive oxide is formed on the substrate (2).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.