Imaging optical unit and projection exposure apparatus for projection lithography comprising such an imaging optical unit

US9291751B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Hans-Juergen Rostalski · Oberkochen, DE
• Sascha Migura · Aalen, DE
• Thomas Schicketanz · Aalen, DE

Key dates

• Filing date: Jun 17, 2013
• Grant date: Mar 22, 2016
• Expiry date: Feb 21, 2034

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/70233
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

An imaging optical unit (7) serves for imaging an object field (4) in an object plane (5) into an image field (8) in an image plane (9). The imaging optical unit (7) has a plurality of components (M1 to M6, GI) which guide imaging light (3). The imaging optical unit (7) is embodied as a pupil-obscured system. The imaging optical unit (7) has at least one mirror (GI) for grazing incidence of the imaging light (3). The result is an imaging optical unit having a handleable combination of low imaging aberrations and compact construction.