Composition comprising a polymeric thermal acid generator and processes thereof
US9291909B2 · kind B2 · utility
2Cited by
19References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 17, 2013 |
| Grant date | Mar 22, 2016 |
| Priority date | — |
| Expiry date | Jul 6, 2033 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0392
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention relates a novel aqueous composition comprising polymeric thermal acid generator and a process of coating the novel composition onto photoresist pattern, thereby forming a layer of the polymeric thermal acid generator over the photoresist pattern. The polymeric thermal acid generator comprises a polymer having at least one repeating unit of structure 2;where R1 to R5 are independently chosen from the group consisting of H and C1-C6 alkyl; R6 is chosen from the group consisting of unsubstituted aryl, substituted aryl, alkyl (C1-C8) and fluoroalkyl (C1-C8) and W is a C2-C6 alkylene spacer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.