EUV light source using cryogenic droplet targets in mask inspection
US9295147B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 13, 2014 |
| Grant date | Mar 22, 2016 |
| Priority date | — |
| Expiry date | Feb 13, 2034 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T137/206
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An apparatus for generating extreme ultra-violet (EUV) light, including a drive laser arranged to produce a laser pulse, a vacuum chamber, a set of focusing optics arranged to focus the laser pulse produced by the drive laser onto a target spot within the vacuum chamber, a target material generator arranged to deliver a series of droplets of a target material to the target spot by modulating a flow velocity of a supply of the target material through a nozzle tip and thereby inducing a formation process of the series of droplets which series of droplets from the nozzle tip are expelled through a triple point chamber, and a set of collector optics arranged to focus a quantity of EUV light generated when a droplet of the series of drople of the target material is exposed to the laser pulse at the target spot onto an intermediate focus spot.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.