Multi facet mirror of a microlithographic projection exposure apparatus

US9298101B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Thorsten Rassel · Wertingen, DE
• Markus Hauf · Ulm, DE

Key dates

• Filing date: Apr 27, 2015
• Grant date: Mar 29, 2016
• Expiry date: Apr 27, 2035

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/70825
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A multi facet mirror of a microlithographic projection exposure apparatus includes a plurality of mirror facet units. Each unit includes a mirror member with a body, a reflective coating provided at one end of the body and an actuating surface provided at an opposite end. The unit further includes a rest member on which the actuating surface rests while the mirror member is not moving, and an actuator that tilts the mirror member about a tilting axis. The actuator has a contact surface and a lifting member which moves the actuating surface along a lifting direction. In a first operating state of the lifting member the actuating surface rests on the rest member and in a second operating state on the contact surface. A displacement member displaces the contact surface along a lateral direction only while the lifting member is in the second operating state.