Solvent annealing block copolymers on patterned substrates
US9299381B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 6, 2012 |
| Grant date | Mar 29, 2016 |
| Priority date | — |
| Expiry date | May 3, 2034 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24802
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
Provided herein are block copolymer thin film structures and methods of fabrication. Aspects described herein include methods of directed self-assembly of block copolymers on patterns using solvent annealing, and the resulting thin films, structures, media or other compositions. According to various embodiments, solvent annealing is used direct the assembly of block copolymers on chemical patterns to achieve high degrees of pattern perfection, placement of features at the precision of the lithographic tool used to make the chemical pattern, improved dimensional control of features, improved line edge and line width roughness, and resolution enhancement by factors of two to four or greater.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.