Resist composition and method for producing semiconductor device
US9304399B2 · kind B2 · utility
0Cited by
0References
5Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 16, 2014 |
| Grant date | Apr 5, 2016 |
| Priority date | — |
| Expiry date | May 16, 2034 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/0273
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A resist composition includes: a crosslinking material that is crosslinked in the presence of an acid; an acid amplifier; and a solvent.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.