Measurement of the position of a radiation beam spot in lithography
US9304401B2 · kind B2 · utility
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44References
20Claims
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Key dates
| Filing date | Feb 22, 2012 |
| Grant date | Apr 5, 2016 |
| Priority date | — |
| Expiry date | Jan 3, 2033 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70275
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A radiation spot measurement system for a lithographic apparatus, the system having a target onto which a radiation system of the lithographic apparatus may project spots of radiation for a measurement process, the target having a measurement target. The system further includes a radiation detector to detect radiation from one of the spots, and a controller to receive information from the radiation detector and to determine the position of the spot of radiation relative to an intended position of the spot of radiation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.