Methods of depositing thin films using molybdenum sputtering targets

US9309591B2 · kind B2 · utility

Assignee

• H.C. STARCK INC. · US

Inventors

• Brad Lemon · Battle Creek, US
• Joseph Hirt · Cypress, US
• Timothy Welling · Portage, US
• James G. Daily, III · Marshall, US
• David Meendering · Coldwater, US
• Gary Alan Rozak · Akron, US
• Jerome O'Grady · Hudson, US
• Prabhat Kumar · Framingham, US
• Steven A. Miller · Pinellas Park, US
• Rong-Chein Richard Wu · Taipei, TW
• David G. Schwartz · Mentor, US

Key dates

• Filing date: Jan 29, 2015
• Grant date: Apr 12, 2016
• Expiry date: Jan 29, 2035

Classification

• Technology area (CPC B): Performing Operations; Transporting
• CPC primary: B22F2998/10
• WIPO field: Materials, metallurgy
• WIPO sector: Chemistry

Abstract

In various embodiments, tubular sputtering targets comprising molybdenum are provided and sputtered to produce thin films comprising molybdenum. The sputtering targets may be formed by forming a tubular billet having an inner diameter IDI and an outer diameter ODI, the formation comprising pressing molybdenum powder in a mold and sintering the pressed molybdenum powder, working the tubular billet to form a worked billet having an outer diameter ODf smaller than ODI, and heat treating the worked billet. The sputtering targets may have a substantially uniform texture of (a) a 110 orientation parallel to a longitudinal direction and (b) a 111 orientation parallel to a radial direction.