Device for guiding electromagnetic radiation into a projection exposure apparatus
US9310701B2 · kind B2 · utility
0Cited by
3References
18Claims
0Family size
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Key dates
| Filing date | Feb 8, 2012 |
| Grant date | Apr 12, 2016 |
| Priority date | — |
| Expiry date | Apr 10, 2034 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70883
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A device for guiding electromagnetic radiation into a projection exposure apparatus for semiconductor lithography includes an optical fiber and an actuator for the mechanical manipulation of a section of the fiber as a result of which a temporally averaged homogenization of an intensity profile of electromagnetic radiation emerging at an exit end of the fiber can be achieved. A projection exposure apparatus for semiconductor lithography is equipped with the abovementioned device.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.