Andras G. Major
17Patents
3h-index
31Co-inventors
56Inventor score
Filing activity: Jul 16, 2009 → Dec 9, 2021
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9013684B2 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Emerging Cross-Sectional Technologies | 15 | Active |
| US8339577B2 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Emerging Cross-Sectional Technologies | 6 | Active |
| US8854604B2 | Microlithographic projection exposure apparatus | Physics | 4 | Active |
| US7782443B2 | Illumination system of a microlithographic projection exposure apparatus | Physics | 3 | Active |
| US9897925B2 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Emerging Cross-Sectional Technologies | 1 | Active |
| US8773639B2 | Illumination system of a microlithographic projection exposure apparatus | Physics | 1 | Active |
| US9013680B2 | Illumination system of a microlithographic projection exposure apparatus | Physics | 1 | Active |
| US9946161B2 | Optical system for a microlithographic projection exposure apparatus and microlithographic exposure method | Physics | 1 | Active |
| US9239229B2 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Emerging Cross-Sectional Technologies | 1 | Active |
| US10161808B2 | Method and arrangement for determining the heating condition of a mirror in an optical system | Physics | 1 | Active |
| US8164046B2 | Illumination system for illuminating a mask in a microlithographic projection exposure apparatus | Physics | 1 | Active |
| US9310701B2 | Device for guiding electromagnetic radiation into a projection exposure apparatus | Physics | 0 | Active |
| US9019475B2 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Emerging Cross-Sectional Technologies | 0 | Active |
| US12249478B2 | Particle beam system for azimuthal deflection of individual particle beams and method for azimuth correction in a particle beam system | Electricity | 0 | Active |
| US12293896B2 | Particle beam system | Electricity | 0 | Active |
| US9001309B2 | Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus | Emerging Cross-Sectional Technologies | 0 | Active |
| US9052606B2 | Microlithographic projection exposure apparatus | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.