Heterogeneous integration of memory and split-architecture processor
US9312253B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 6, 2015 |
| Grant date | Apr 12, 2016 |
| Priority date | — |
| Expiry date | Jan 6, 2035 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2924/18161
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A method for fabricating a semiconductor device provides a first chip having first terminals, a second chip having second terminals, and a third chip having third terminals. A first silicon interposer having first through silicon vias TSVs and a second silicon interposer having second TSVs is provided. The first TSVs are arrayed in a first, a second, and a third set. The first set is located in a first interposer region and matching the first terminals. The second set is located in a second interposer region and matching the second terminals. The third set is located in a third interposer region between the first and second regions and matching the TSVs of the second interposer and the third terminals. The first chip is aligned with the first set TSVs. The second chip is aligned with the second set TSVs. The second interposer is aligned with the third set TSVs. A solder of a first melting temperature is used.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.