Magnetic devices and methods of manufacturing the same
US9312478B2 · kind B2 · utility
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18Claims
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Key dates
| Filing date | Aug 20, 2012 |
| Grant date | Apr 12, 2016 |
| Priority date | — |
| Expiry date | Sep 10, 2034 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24479
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
Magnetic devices, and methods of manufacturing the same, include a stack structure including at least one magnetic layer, etched using an etching gas including at least 70 volume percent of a hydrogen-containing gas and at least 2 volume percent of CO gas.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.