Inventor · Seoul, KR

Hak-Sun Lee

16Patents
4h-index
41Co-inventors
56Inventor score

Filing activity: Jan 30, 2007 → Dec 15, 2021

Most-cited inventions

PatentTitleAreaCited byStatus
US7550391B2 Method for forming fine patterns of a semiconductor device using double patterning Emerging Cross-Sectional Technologies 18 Active
US7576010B2 Method of forming pattern using fine pitch hard mask Electricity 11 Active
US7601647B2 Method of forming fine patterns of semiconductor device using double patterning Electricity 10 Active
US9190404B2 Semiconductor device and method of fabricating the same Electricity 8 Active
US8669622B2 Non-volatile semiconductor devices and methods of manufacturing non-volatile semiconductor devices Electricity 4 Active
US9312181B2 Semiconductor device, electronic device including the same and manufacturing methods thereof Electricity 3 Active
US9929099B2 Planarized interlayer dielectric with air gap isolation Electricity 3 Active
US8003469B2 Method of manufacturing non-volatile semiconductor devices Electricity 2 Active
US7998874B2 Method for forming hard mask patterns having a fine pitch and method for forming a semiconductor device using the same Electricity 2 Active
US7935635B2 Method of forming fine patterns of semiconductor devices using double patterning Electricity 1 Active
US10600653B2 Method for forming a fine pattern Electricity 1 Active
US11876017B2 Integrated circuit devices including enlarged via and fully aligned metal wire and methods of forming the same Electricity 0 Active
US10186485B2 Planarized interlayer dielectric with air gap isolation Electricity 0 Active
US8178408B2 Methods of manufacturing charge trap-type non-volatile memory devices Electricity 0 Active
US11232986B2 Integrated circuit devices including enlarged via and fully aligned metal wire and methods of forming the same Electricity 0 Active
US9312478B2 Magnetic devices and methods of manufacturing the same Emerging Cross-Sectional Technologies 0 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.