Method and system for measuring patterned substrates
US9316490B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Apr 23, 2014 |
| Grant date | Apr 19, 2016 |
| Priority date | — |
| Expiry date | Aug 6, 2034 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01B2290/70
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A system and method of measuring feature depth using a common path auto-correlation low coherence interferometer including a light source having an output directed toward a first beam splitter, the first beam splitter directing at least a portion of a light beam from the light source toward a sample having two reflective interfaces including a top surface reflective interface and a feature bottom reflective interface. The first beam splitter can also pass toward a second beam splitter each of a reference light beam reflected from the top surface interface and a measurement light beam reflected from the feature bottom reflective interface. The second beam splitter directs the reference light beam to a first mirror and the measurement light beam to a second mirror and combines a reflected measurement light beam from the second mirror and a reflected reference light beam from the first mirror to form an interference pattern.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.